The spatial resolution of a microscope is a key performance criterion in many scientific and industrial applications. At present, only the most advanced electron and scanning-probe microscopes can ...

The future of computing depends on miniaturization, and extreme ultraviolet lithography (EUV) is one key enabler. Until recently, we have relied on low numerical aperture (NA) EUV systems with an ...

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history. This raises a ...

Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...

Light Pipes/Blocks with all the surface polished.Light pipe homogenizing rods utilize total internal reflection to homogenize non-uniform light sources regardless of their spectral characteristics.